| High Reflectivity Laser Line Mirrors | |
|---|---|
| Substrate Material | UV grade fused silica |
| Clear Aperture | >85% |
| Dimensions Tolerance | +0/-0,15 mm |
| Thickness Tolerance | ±0,25 mm |
| Parallelism | <30 arcsec |
| Protective Chamfers | <0,35 mm at 45° |
| Surface Quality | 20-10 S-D |
| Surface Flatness | <λ/8@632,8 nm |
| LIDT | 1 J/cm2@1064 nm, 10 ns (for 750-1100 nm mirrors) |
| Model | Size | Wavelength | Reflectivity |
|---|---|---|---|
| 6289 | Ø25.4 x 5mm | 350-400nm | >99% |
| 6290 | Ø25.4 x 5mm | 400-700nm | >99% |
| 6323 | Ø25.4 x 5mm | 750-1100nm | >99% |
| 6326 | Ø25.4 x 5mm | 1280-1600nm | >99% |
| Model | Size | Wavelength | Reflectivity |
|---|---|---|---|
| 6327 | Ø25.4 x 5mm | 350-400nm | >99%(s+p)/2 |
| 6324 | Ø25.4 x 5mm | 400-700nm | >99%(s+p)/2 |
| 6328 | Ø25.4 x 5mm | 750-1100nm | >99%(s+p)/2 |
| 6325 | Ø25.4 x 5mm | 1280-1600nm | >99%(s+p)/2 |